INVESTIGATION OF HYDROGEN, CARBON AND FURTHER IMPURITIES IN THE METALORGANIC VAPOR-PHASE EPITAXY OF ZNSE WITH DITERTIARYBUTYLSELENIDE AND METHYLALLYLSELENIDE
Ws. Kuhn et al., INVESTIGATION OF HYDROGEN, CARBON AND FURTHER IMPURITIES IN THE METALORGANIC VAPOR-PHASE EPITAXY OF ZNSE WITH DITERTIARYBUTYLSELENIDE AND METHYLALLYLSELENIDE, Journal of crystal growth, 138(1-4), 1994, pp. 448-454
The impurities in ZnSe layers grown by metalorganic vapour phase epita
xy (MOVPE) on (001) GaAs have been investigated by photoluminescence (
PL) and secondary ion mass spectrometry (SIMS) measurements. The layer
s grown with the alkyl combination methylallylselenide/diethylzinc (MA
Se/DEZn) exhibit the incorporation of C and H detected by SIMS. The us
e of helium instead of the hydrogen carrier gas increases the incorpor
ation of C and H. At very high concentrations (H almost-equal-to 10(20
) cm-3) a new PL peak at 2.786 eV appeared. The mass spectroscopic inv
estigation of the pyrolysis of MASe revealed a simple bound cleavage a
s the dominant mechanism which generates the intermediate species SeCH
3. The following extrinsic impurities were found in the layers: (1) Cu
from the growth system (PL, SIMS); (2) halogen (Br and 1) from the Se
source (PL, synthesis, SIMS); (3) oxygen from the system or carrier g
as (SIMS); (4) Te from former ZnTe growth (SIMS); (5) As and Ga from t
he substrate (SIMS). The layers grown with the alkyl combination diter
tiarybutylselenide/dimethylzinc-triethylamine (DTBSe/DMZn-TEN) show we
ak contaminations by C and H as detected by SIMS. The mass-spectroscop
ic investigation of the pyrolysis of DTBSe revealed H2Se and elemental
Se as products from parallel mechanisms. The volatile alkyls isobutan
e and isobutene are found as reaction products. The role of the Zn alk
yl as the source of the C and H incorporation is not yet clarified. Th
e following extrinsic impurities were found in the layers: (1) Cu from
the growth system (SIMS); (2) either Al or Cl as a donor (PL); (3) 0
from the system or carrier gas (SIMS); (4) S possibly from substrate p
reparation (SIMS); (5) As and Ga from the substrate (PL, SIMS). Howeve
r, the layer purity is already sufficient for first doping experiments
. With P doping, a hole concentration of 10(15) cm-3 is achieved.