THE STUDY OF LATTICE STRAIN AND HIGH-RESOLUTION TRANSMISSION ELECTRON-MICROSCOPY IN ZNSE-ZNS STRAINED-LAYER SUPERLATTICES

Citation
Zp. Guan et al., THE STUDY OF LATTICE STRAIN AND HIGH-RESOLUTION TRANSMISSION ELECTRON-MICROSCOPY IN ZNSE-ZNS STRAINED-LAYER SUPERLATTICES, Journal of crystal growth, 138(1-4), 1994, pp. 534-537
Citations number
7
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
138
Issue
1-4
Year of publication
1994
Pages
534 - 537
Database
ISI
SICI code
0022-0248(1994)138:1-4<534:TSOLSA>2.0.ZU;2-J
Abstract
The structural properties of ZnSe-ZnS strained-layer superlattices (SL Ss) grown on GaAs (100) by atmospheric-pressure metalorganic chemical vapor deposition (AP-MOCVD) were studied using high-resolution transmi ssion electron microscopy (HRTEM). The type and distribution of the de fects in ZnSe-ZnS SLS are related to the surface quality of GaAs subst rate, of the buffer layer and the thickness of each layer for ZnSe and ZnS in SLS. In this work we noticed that there are stacking faults (S Fs), mismatch defects (MDs) and microtwins (MTs) in ZnSe1-xSx buffer l ayer at interfacial steps due to the GaAs surface not being smooth, an d the dislocation can penetrate the ZnSe-ZnS SLS layer.