ENERGY-TRANSFER PROCESSES VIA THE INTERFACE OF ZNSE GAAS EPILAYERS/

Citation
N. Presser et al., ENERGY-TRANSFER PROCESSES VIA THE INTERFACE OF ZNSE GAAS EPILAYERS/, Journal of crystal growth, 138(1-4), 1994, pp. 820-825
Citations number
13
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
138
Issue
1-4
Year of publication
1994
Pages
820 - 825
Database
ISI
SICI code
0022-0248(1994)138:1-4<820:EPVTIO>2.0.ZU;2-L
Abstract
In the present paper, energy transfer processes via the interface of m olecular beam epitaxy (MBE) grown ZnSe/GaAs epilayers are investigated by means of time-resolved photoluminescence spectroscopy. High excita tion experiments show that an electron-hole plasma exists in free-stan ding ZnSe layers only. By comparing the time-resolved luminescence pro perties of ZnSe/GaAs heterostructures and of free-standing ZnSe layers , we demonstrate which kind of energy transfer mechanism is predominan t in heterostructures: At low excitation densities energy is transfere d by re-absorption of the ZnSe luminescence. At higher excitation dens ities, an ambipolar carrier diffusion via the ZnSe/GaAs interface is t he dominating process.