STUDY OF THE DEPTH PROFILE OF PHOSPHORUS DIFFUSION IN SILICON BY AUGER-ELECTRON SPECTROSCOPY

Authors
KOSTISHKO BM ORLOV AM LEVKINA TG
Citation
Bm. Kostishko et al., STUDY OF THE DEPTH PROFILE OF PHOSPHORUS DIFFUSION IN SILICON BY AUGER-ELECTRON SPECTROSCOPY, Inorganic materials, 30(6), 1994, pp. 794-795
Citations number
4
Categorie Soggetti
Material Science
Journal title
Inorganic materials → ACNP
ISSN journal
00201685
Volume
30
Issue
6
Year of publication
1994
Pages
794 - 795
Database
ISI
SICI code
0020-1685(1994)30:6<794:SOTDPO>2.0.ZU;2-S