ORIGIN OF OPTICAL ANISOTROPY IN STRAINED INXGA1-XAS INP AND INYAL1-YAS/INP HETEROSTRUCTURES/

Citation
Br. Bennett et al., ORIGIN OF OPTICAL ANISOTROPY IN STRAINED INXGA1-XAS INP AND INYAL1-YAS/INP HETEROSTRUCTURES/, Journal of electronic materials, 23(4), 1994, pp. 423-429
Citations number
34
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
23
Issue
4
Year of publication
1994
Pages
423 - 429
Database
ISI
SICI code
0361-5235(1994)23:4<423:OOOAIS>2.0.ZU;2-M
Abstract
Optical anisotropy in mismatched InxGa1-xAs/InP and InyAl1-yAs/InP het erostructures has been investigated by variable azimuthal angle ellips ometry and reflectance difference spectroscopy. The two approaches are shown to yield strongly correlated results. A comparison to high reso lution x-ray diffraction, transmission electron microscopy, and atomic force microscopy studies indicates that large optical anisotropies ar e associated with surface roughening that results from three-dimension al growth. Our findings demonstrate that fast and nondestructive measu rements of optical anisotropy can provide important information about the growth mode and crystalline quality of strained epitaxial layers.