BLEACHABLE DYED RESIST - INVESTIGATION OF ITS PROCESS LATITUDE IN COMPARISON WITH STANDARD RESISTS

The process latitude of a resist with a bleachable dye component is in vestigated theoretically with respect to most interesting lithographic parameters and compared with standard dyed and undyed as well as with heavy PAC-loaded resists. Bleachable dyed resists are found to increa se the process latitude especially on highly reflective substrates wit h topography. This is due to the attenuation of irregular reflections and the interference of the light by a stronger absorption, and by red uction of the bulk effect, which is caused by contrast enhancement due to the bleachable dye component. Calculations are made using a modifi cation of Dill's model and the process simulator LITHSIM.