PHOTOLITHOGRAPHY OVERVIEW FOR 64 MEGABIT PRODUCTION

Authors
LESLIE T ARDEN W BENJACOB J COLEMAN D POLIMENI J PREIN F
Citation
T. Leslie et al., PHOTOLITHOGRAPHY OVERVIEW FOR 64 MEGABIT PRODUCTION, Microelectronic engineering, 25(1), 1994, pp. 67-74
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
25
Issue
1
Year of publication
1994
Pages
67 - 74
Database
ISI
SICI code
0167-9317(1994)25:1<67:POF6MP>2.0.ZU;2-F
Abstract
The joint IBM and Siemens 64 megabit development program has recently demonstrated successful fabrication of a 64 megabit prototype DRAM. Ev en with significant reduction in groundrules compared to the 16 Megabi t DRAM, a photolithography process was developed and implemented with a high degree of success. This paper describes the tool set, the proce ss and its performance and some of the issues faced in achieving this accomplishment.