TEMPERATURE-DEPENDENCE OF MINORITY HOLE MOBILITY IN N-GAAS MEASURED WITH A NEW VARIABLE-TEMPERATURE TECHNIQUE()

Citation
Ml. Lovejoy et al., TEMPERATURE-DEPENDENCE OF MINORITY HOLE MOBILITY IN N-GAAS MEASURED WITH A NEW VARIABLE-TEMPERATURE TECHNIQUE(), Journal of electronic materials, 23(7), 1994, pp. 669-673
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
23
Issue
7
Year of publication
1994
Pages
669 - 673
Database
ISI
SICI code
0361-5235(1994)23:7<669:TOMHMI>2.0.ZU;2-1
Abstract
The temperature-dependent mobility provides essential information for device design and serves as a sensitive probe of minority carrier scat tering physics. As examples, dominant scattering mechanisms are identi fied by characteristic temperature dependencies of mobility and for lo w temperature bipolar device optimization, accurate minority carrier m obility data are required. We report the first temperature (T) depende nt measurement of minority hole mobility in n+-GaAs. The minority carr ier mobility (mu) was measured with the zero-field time-of-flight tech nique. In this technique, minority carrier diffusivity (D), where De = mukT, is determined from the transient response of a specially design ed photodiode that is excited by a high-speed laser. We have extended the technique to permit continuously variable, T-dependent minority mo bility measurements. The unique cryostat design, including device moun ting, low-loss feedthroughs and temperature measurement scheme, is pre sented.