WET CLEANINGS ADAPTED TO BACK-END PROCESSES

Authors
TARDIF F PALLEAU J LARDIN T DEMOLLIENS O VINCENT A TORRES J
Citation
F. Tardif et al., WET CLEANINGS ADAPTED TO BACK-END PROCESSES, Microelectronic engineering, 33(1-4), 1997, pp. 195-201
Citations number
8
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
33
Issue
1-4
Year of publication
1997
Pages
195 - 201
Database
ISI
SICI code
0167-9317(1997)33:1-4<195:WCATBP>2.0.ZU;2-9
Abstract
After analysis of the backend requirements in terms of cleanings, diff erent mineral diluted recipes were optimised to remove particles and m etallic impurities. Diluted HF based chemistries seem to be very promi sing in terms of contamination removal efficiency and are compatible w ith the presence of metal lines except for those made of aluminium.