MODEL FOR THE GROWTH AND REACTIVITY OF METAL-FILMS ON OXIDE SURFACES - CU ON ZNO(0001)-O

Citation
Ct. Campbell et A. Ludviksson, MODEL FOR THE GROWTH AND REACTIVITY OF METAL-FILMS ON OXIDE SURFACES - CU ON ZNO(0001)-O, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1825-1831
Citations number
62
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
07342101
Volume
12
Issue
4
Year of publication
1994
Part
2
Pages
1825 - 1831
Database
ISI
SICI code
0734-2101(1994)12:4<1825:MFTGAR>2.0.ZU;2-C
Abstract
In the many studies of vapor deposition of late transition metals on s ingle-crystal oxide surfaces, never has a low-energy electron diffract ion superstructure been observed in the first layer. Although layer-by -layer behavior is often reported at less-than-or-equal-to 300 K, anne aling the films generally leads to irreversible clustering into thick islands that cover a tiny part of the oxide. We discuss here a growth model that explains these general observations and is also consistent with the expected energetics for metal atom diffusion over oxide and m etal terraces and up and down over the edges of metal islands. We brie fly review our recent studies which led to this model, in which the st ructural, electronic, and chemical properties of Cu films on the oxyge n-terminated ZnO(0001BAR)-O surface were examined. At coverages beyond a few percent, vapor-deposited Cu adatoms become nearly neutral. Thei r chemical behavior indicates that they form two-dimensional (2D) isla nds with metal-like Cu-Cu distances, much shorter than the substrate l attice parameter. Further deposition of Cu leads to spreading of these 2D islands without forming thicker layers, until about 55% of the sur face is covered. Thereafter, these Cu islands grow thicker without fil ling the voids between islands, except at a rate much slower than the rate at which Cu vapor strikes in these voids. Our new model shows tha t a large fraction of an oxide surface will first be covered by 2D isl ands during metal deposition at low temperatures due to a kinetic effe ct. This occurs even when the metal's adsorption energy on itself sign ificantly exceeds its adsorption energy on the oxide (i.e., when 3D cl ustering is thermodynamically favored), provided the difference in the se energies does not exceed the energy of 2D evaporation from island e dges onto terraces. As soon as islands nucleate in the second layer, 2 D spreading ceases and energetic pathways open that allow metal atoms to migrate up from the oxide terrace into this new layer. This can lea d to thick, flat-topped islands. Atom-thin (2D) Cu islands on ZnO(0001 BAR)-O react with CO, O2, H2O, HCOOH, and CH3OH very much like Cu(110) , although there are some differences: The transiently adsorbed H and CO2 products of HCOOH dissociation migrate off or under the Cu islands and interact strongly with ZnO sites, and O(a) is not as good a Brons ted base as on Cu(110). Annealed 3D islands behave much like Cu(111). We present here new results for methyl iodide adsorption and methyl di ssociation on these Cu islands which further support this general pict ure.