Tm. Jung et al., GROWTH AND ENERGETICS OF GA AND AL CHAINS ON SI(112), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1838-1842
Citations number
16
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
We present a low-energy electron diffraction and Auger electron spectr
oscopy (AES) study of the growth of Al and Ga chains on Si(112) substr
ates. For substrate temperatures between 500 and 650-degrees-C growth
proceeds first by the creation of metal atom chains along the step edg
es of the (112) surface. Once the step-edge sites have been occupied,
a state defined here as ''saturation coverage,'' excess deposition lea
ds to island formation with no further increase in the metal AES signa
l intensity. The clean Si(112) (1 X 2) surface reconstruction is remov
ed upon the formation of the metal chains so that the equivalence of a
djacent single-layer-height steps is restored. At the saturation cover
age both the Al and Ga chains exhibit a sixfold periodicity along the
step edge, or [110BAR], direction. Below the saturation coverage these
chains can also exhibit a fivefold periodicity along the same directi
on. We propose a model in which the periodicities of the chains are de
termined by the density of dimerized Si edge atoms, i.e, metal atom va
cancies, whose presence balances the tensile stress imposed by the lar
ger metal atoms. We investigate the relative binding energies of Al an
d Ga to the step-edge sites and find that Al atoms are more strongly b
ound. At substrate temperatures near 600-degrees-C die deposition of A
l on a Ga saturated surface leads to the complete substitution of Ga b
y Al atoms at the step-edge sites.