Re. Cavicchi et al., PULSED DESORPTION-KINETICS USING MICROMACHINED MICROHOTPLATE ARRAYS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 2549-2553
Citations number
18
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
We demonstrate a technique for obtaining desorption kinetics parameter
s by applying temperature pulses to small samples. In these experiment
s we use an array of micromachined hotplates, each with a temperature
range from 300 to 1300 K and a thermal response time of 5 ms. Array el
ements are 100 mumX200 mum and have a mass of 0.4 mug. A metal film is
deposited on the microhotplate array surface. After exposing the samp
le to a gas species of interest, a sequence of temperature pulses of c
ontrolled duration is applied to the array elements. The desorption si
gnal from each pulse is recorded using a mass spectrometer. For each t
emperature, the desorption time constant is determined. A simple Arrhe
nius plot of desorption time constant versus inverse temperature yield
s directly the activation energy for desorption and the rate constant
prefactor or frequency factor. The results are independent of the pump
ing speed of the vacuum system. The technique is demonstrated for adso
rbed CO on platinum using temperature pulses that range over nearly fo
ur orders of magnitude in duration.