Conducting joints with low fabrication temperatures and high thermal s
tability are useful in modern electronics. This paper discusses the po
tential use of intermetallic phases in making such joints. Thin interc
onnection layers that consist entirely of intermetallic phases have be
en produced by joining planar Cu substrates that are coated with thin
films of Sn. Thin layers (1-5 mum) of intermetallic phase are produced
at temperatures slightly above the melting temperature of Sn in a pro
cess similar to reflow soldering. Metallography and x-ray analysis are
used to characterize the formation mechanism of the intermetallic. Cu
dissolves into the liquid Sn by diffusion along narrow channels betwe
en grains of the growing eta-Cu6Sn5 intermetallic phase. Tensile tests
were used to measure mechanical properties. The joint strength increa
sed with reaction time. The joint fails in a ductile mode as long as u
nreacted Sn is present, but fractures along interphase boundaries when
the joint is completely intermetallic.