CHARACTERIZATION OF DIAMOND-LIKE CARBON-FILMS GROWN BY SUPER-WIDE ELECTRON-CYCLOTRON-RESONANCE PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION

Authors
ISHII A AMADATSU S MINOMO S TANIGUCHI M SUGIYO M
Citation
A. Ishii et al., CHARACTERIZATION OF DIAMOND-LIKE CARBON-FILMS GROWN BY SUPER-WIDE ELECTRON-CYCLOTRON-RESONANCE PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1068-1071
Citations number
8
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
12
Issue
4
Year of publication
1994
Part
1
Pages
1068 - 1071
Database
ISI
SICI code
0734-2101(1994)12:4<1068:CODCGB>2.0.ZU;2-L
Abstract
An electron-cyclotron resonance plasma source that generates 500 mm wi de plasma has been developed. The plasma is generated by a 2.45 GHz tr aveling microwave which is supplied through a long slot antenna prepar ed in the waveguide in a divergent magnetic field generated by permane nt magnets and a solenoid coil. Diamondlike carbon (DLC) films were de posited in a wide zone 320 mm in width. The breakdown field was 8.4 X 10(6) V/cm and permittivity, 3.89. The prepared Al/DLC/Si metal/insula tor/semiconductor diode revealed fairly good field effect in its capac itance-voltage curve.