PROPERTIES OF CHEMICAL-VAPOR INFILTRATION DIAMOND DEPOSITED IN A DIAMOND POWDER MATRIX

Citation
Jkg. Panitz et al., PROPERTIES OF CHEMICAL-VAPOR INFILTRATION DIAMOND DEPOSITED IN A DIAMOND POWDER MATRIX, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1480-1486
Citations number
9
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
ISSN journal
07342101
Volume
12
Issue
4
Year of publication
1994
Part
1
Pages
1480 - 1486
Database
ISI
SICI code
0734-2101(1994)12:4<1480:POCIDD>2.0.ZU;2-N
Abstract
Densifying nonmined diamond powder precursors with diamond produced by chemical vapor infiltration is an attractive approach for forming thi ck diamond deposits that avoids many potential manufacturability probl ems associated with predominantly chemical vapor deposition (CVD) proc esses. We have developed two techniques: electrophoretic deposition an d screen printing, to form diamond powder precursors on substrates. We then density these precursors in a hot filament assisted reactor. Ana lysis indicates that a hot-filament-assisted chemical vapor infiltrati on process forms intergranular diamond deposits with properties that a re to some degree different from predominantly hot-filament-assisted C VD material.