INFLUENCE OF ION MASS AND ION ENERGY ON MICROSTRUCTURE OF ION-ASSISTED DEPOSITED ZINC SELENIDE THIN-FILMS

Zinc selenide thin films have been deposited by an ion beam assisted e vaporation system in order to investigate the influence of some deposi tion parameters, with particular interest on incident ions energy, on film microstructure by means of x-ray diffraction in conventional Brag g-Brentano reflection geometry. Two different ion kinds (Ar and Xe) ha ve been employed during the deposition process in order to analyze the effect of the ion mass on the microstructure of the growing thin film . The correlation of the microstructure and some mechanical properties of films deposited with different parameters has been analyzed. Moreo ver, thin films composition has been analyzed by Rutherford backscatte ring technique and the correlation with the energy ions is reported.