CLUSTER MODEL STUDY OF THE CHEMISORPTION OF ATOMIC CARBON ON SI(100) SURFACES

Citation
J. Torras et al., CLUSTER MODEL STUDY OF THE CHEMISORPTION OF ATOMIC CARBON ON SI(100) SURFACES, Journal of crystal growth, 172(1-2), 1997, pp. 106-114
Citations number
39
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
172
Issue
1-2
Year of publication
1997
Pages
106 - 114
Database
ISI
SICI code
0022-0248(1997)172:1-2<106:CMSOTC>2.0.ZU;2-1
Abstract
Structural parameters for chemisorption of atomic carbon above a Si(10 0) surface have been obtained through a Si35H32 cluster model and a MI NDO/3 hamiltonian. The most stable position has been found to be the b ridge one when considering the unrelaxed surface. The stability increa ses about 14 kcal/mol when relaxation of the surface is allowed. Furth er research has been carried out using a reduced cluster model (Si9H12 ) at the ab initio Hartree-Fock level of calculation. Results confirm the increase of stability of the relaxed system. At this level, the bi nding energy is 90 kcal/mol for the unrelaxed surface and the stabiliz ation when the surface is relaxed is of about 20% with respect to the non-relaxed surface.