J. Torras et al., CLUSTER MODEL STUDY OF THE CHEMISORPTION OF ATOMIC CARBON ON SI(100) SURFACES, Journal of crystal growth, 172(1-2), 1997, pp. 106-114
Structural parameters for chemisorption of atomic carbon above a Si(10
0) surface have been obtained through a Si35H32 cluster model and a MI
NDO/3 hamiltonian. The most stable position has been found to be the b
ridge one when considering the unrelaxed surface. The stability increa
ses about 14 kcal/mol when relaxation of the surface is allowed. Furth
er research has been carried out using a reduced cluster model (Si9H12
) at the ab initio Hartree-Fock level of calculation. Results confirm
the increase of stability of the relaxed system. At this level, the bi
nding energy is 90 kcal/mol for the unrelaxed surface and the stabiliz
ation when the surface is relaxed is of about 20% with respect to the
non-relaxed surface.