THE EFFECT OF HEAT-TREATMENT ON THE MAGNITUDE AND COMPOSITION OF RESIDUAL-GAS IN SEALED SILICA GLASS AMPOULES

Authors
PALOSZ W SZOFRAN FR LEHOCZKY SL
Citation
W. Palosz et al., THE EFFECT OF HEAT-TREATMENT ON THE MAGNITUDE AND COMPOSITION OF RESIDUAL-GAS IN SEALED SILICA GLASS AMPOULES, Journal of crystal growth, 142(1-2), 1994, pp. 215-224
Citations number
13
Categorie Soggetti
Crystallography
Journal title
Journal of crystal growth → ACNP
ISSN journal
00220248
Volume
142
Issue
1-2
Year of publication
1994
Pages
215 - 224
Database
ISI
SICI code
0022-0248(1994)142:1-2<215:TEOHOT>2.0.ZU;2-X
Abstract
The residual gas pressure and composition in sealed silica glass ampou les as a function of different treatment procedures has been investiga ted. The dependence of the residual gas on the outgassing and annealin g parameters has been determined. The effects of the fused silica bran d, of the ampoule fabrication, and of post-outgassing procedures have been evaluated.