OPTIMIZATION OF MOVPE GROWN INXAL1-XAS IN0.53GA0.47AS PLANAR HETEROEPITAXIAL SCHOTTKY DIODES FOR TERAHERTZ APPLICATIONS/

Citation
Ks. Hong et al., OPTIMIZATION OF MOVPE GROWN INXAL1-XAS IN0.53GA0.47AS PLANAR HETEROEPITAXIAL SCHOTTKY DIODES FOR TERAHERTZ APPLICATIONS/, I.E.E.E. transactions on electron devices, 41(9), 1994, pp. 1489-1497
Citations number
18
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
41
Issue
9
Year of publication
1994
Pages
1489 - 1497
Database
ISI
SICI code
0018-9383(1994)41:9<1489:OOMGII>2.0.ZU;2-W
Abstract
The feasibility of InP-based planar heteroepitaxial diodes for teraher tz multiplier and mixer applications is explored. A variety of InxAl1- x As/In0.53Ga0.47As (x = 0.52, 0.4) diodes have been grown using LP-MO VPE and allows systematic characterization of the effects of barrier t hickness, InAs mole fraction and active layer thickness on the diode D C and RF performance. A new fabrication technology is developed for pl anar diodes using dielectric-free air-bridged anode fingers and trench isolation to minimize series resistance and parasitic capacitance. A qualitative model is suggested to explain the forward current conducti on mechanism of the reported diodes. The control of forward current co nduction and reverse leakage by epitaxial design together with the dem onstrated figure-of-merit cutoff frequency of 2.6 THz make the diodes suitable for multiplier and mixer terahertz applications.