Ks. Hong et al., OPTIMIZATION OF MOVPE GROWN INXAL1-XAS IN0.53GA0.47AS PLANAR HETEROEPITAXIAL SCHOTTKY DIODES FOR TERAHERTZ APPLICATIONS/, I.E.E.E. transactions on electron devices, 41(9), 1994, pp. 1489-1497
The feasibility of InP-based planar heteroepitaxial diodes for teraher
tz multiplier and mixer applications is explored. A variety of InxAl1-
x As/In0.53Ga0.47As (x = 0.52, 0.4) diodes have been grown using LP-MO
VPE and allows systematic characterization of the effects of barrier t
hickness, InAs mole fraction and active layer thickness on the diode D
C and RF performance. A new fabrication technology is developed for pl
anar diodes using dielectric-free air-bridged anode fingers and trench
isolation to minimize series resistance and parasitic capacitance. A
qualitative model is suggested to explain the forward current conducti
on mechanism of the reported diodes. The control of forward current co
nduction and reverse leakage by epitaxial design together with the dem
onstrated figure-of-merit cutoff frequency of 2.6 THz make the diodes
suitable for multiplier and mixer terahertz applications.