M. Mehrotra et Bj. Baliga, LOW FORWARD DROP JBS RECTIFIERS FABRICATED USING SUBMICRON TECHNOLOGY, I.E.E.E. transactions on electron devices, 41(9), 1994, pp. 1655-1660
This paper demonstrates the impact of using submicron technology (0.5
mum design rules) on JBS Rectifiers to achieve very low forward voltag
e drops while maintaining good high temperature reverse blocking chara
cteristics. Two dimensional numerical simulations show that decreasing
P+-junction width and depth improves the on-state voltage drop by imp
roved utilization of the active area for the Schottky region and impro
ved spreading of majority carrier current from the Schottky contact. E
xperimental results that demonstrate the capability to reduce the forw
ard drop from 0.5 V to 0.25 V, while operating at up to 125-degrees-C-
175-degrees-C with good reverse blocking capability, are presented. Th
e tradeoff curves between forward drop and reverse leakage current sho
w 45x reduction in leakage current for the same forward drop as compar
ed to previous reports on JBS rectifiers. Power dissipation analysis i
ndicates higher operating temperatures, (100-degrees-C for Ti-JBS and
175-degrees-C for Cr-JBS rectifiers) with reduced heat sink sizes for
the JBS Rectifiers when compared to the conventional Schottky Barrier
Diode (SBD).