GROWTH AND CHARACTERIZATION OF (111)B INGAAS GAAS MULTIQUANTUM-WELL PIN DIODE STRUCTURES/

Citation
Jpr. David et al., GROWTH AND CHARACTERIZATION OF (111)B INGAAS GAAS MULTIQUANTUM-WELL PIN DIODE STRUCTURES/, Journal of electronic materials, 23(9), 1994, pp. 975-982
Citations number
22
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
23
Issue
9
Year of publication
1994
Pages
975 - 982
Database
ISI
SICI code
0361-5235(1994)23:9<975:GACO(I>2.0.ZU;2-R
Abstract
High quality piezoelectric strained InGaAs/GaAs multi-quantum well str uctures on (111)B GaAs substrates have been grown by solid-source mole cular beam epitaxy in a PIN configuration. 10K photoluminescence (PL) shows narrow peaks with widths as low as 3 meV for a 25-period structu re while room temperature (RT) PL shows several higher order peaks, no rmally forbidden, indicating breaking of inversion symmetry by the pie zoelectric field. Furthermore, both the 10K PL peak position and the f orm of the RT PL spectra depend on the number of quantum wells within the intrinsic region, suggesting that the electric-field distribution is altered thereby. Diodes fabricated from these structures had sharp avalanche breakdown voltages (V(bd)) and leakage currents as low as 8 x 10(-6) A/cm2 at 0.95 V(bd), indicating quality as high as in (100) d evices.