EVALUATION OF AN EPITAXIAL LAYER STRUCTURE BY LATERAL FORCE AND CONTACT CURRENT MEASUREMENTS IN A SCANNING FORCE MICROSCOPE

Citation
M. Maywald et al., EVALUATION OF AN EPITAXIAL LAYER STRUCTURE BY LATERAL FORCE AND CONTACT CURRENT MEASUREMENTS IN A SCANNING FORCE MICROSCOPE, Microelectronic engineering, 24(1-4), 1994, pp. 99-106
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
ISSN journal
01679317
Volume
24
Issue
1-4
Year of publication
1994
Pages
99 - 106
Database
ISI
SICI code
0167-9317(1994)24:1-4<99:EOAELS>2.0.ZU;2-H
Abstract
The evaluation of an epitaxial layer structure has been demonstrated b y means of lateral force and contact current measurements, using a for ce microscope under ambient air condition. The specimen was an MOVPE g rown n-doped InP layer on semiinsulating InP that was prepared with an ohmic contact on one side. Lateral force measurements showed a contra st between n-doped and semiinsulating layer whereas the corresponding axial mode image did not. The microscope was equipped with a conductin g tip to perform contact current measurements. Both DC and AC measurem ents showed a strong contrast in conductivity even under bad topograph ical conditions.