RELIABLE EBT FINE POSITIONING USING CORRELATION-BASED WINDOW ADJUSTMENT

A reliable approach for layout-based fine-positioning of an electron b eam is presented. Precise fine positioning can be achieved using mispo sitioning factors derived from layout data in a given window. Consecut ive layout window adjustment leads to an optimized observation window such that the mispositioning probability is minimized. To allow for on -line finepositioning, an algorithm has been developed which computes two-dimensional cross-correlation functions of two sets of line segmen ts rather fast and is used for layout window adjustment as well as for pattern matching purposes. The algorithm is described, results and co mputation times are shown.