EFFECT OF DEPOSITION CONDITIONS ON THE TEXTURE AND SUBSTRUCTURE OF CHEMICAL-VAPOR-DEPOSITED POLYCRYSTALLINE SILICON FILMS

Authors
GORELIK SS SAGALOVA TB SAFONOV YS SULTANOV MA
Citation
Ss. Gorelik et al., EFFECT OF DEPOSITION CONDITIONS ON THE TEXTURE AND SUBSTRUCTURE OF CHEMICAL-VAPOR-DEPOSITED POLYCRYSTALLINE SILICON FILMS, Inorganic materials, 30(3), 1994, pp. 298-301
Citations number
6
Categorie Soggetti
Material Science
Journal title
Inorganic materials → ACNP
ISSN journal
00201685
Volume
30
Issue
3
Year of publication
1994
Pages
298 - 301
Database
ISI
SICI code
0020-1685(1994)30:3<298:EODCOT>2.0.ZU;2-E