Pc. Smith et al., LOW-ENERGY ION-INDUCED ELECTRON-EMISSION FROM GAS-COVERED SURFACES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(5), 1994, pp. 2692-2700
Citations number
19
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Measurements of ion-induced electron emission have been performed with
helium and argon ions with energies between 300 and 900 eV on W, W wi
th 10% Ti, Al, Al with 1% Cu, Al with 1% Si, Si, and Be. This article
describes many of the important surface characteristics that influence
the ion-induced electron emission. For low-energy ions, the substrate
material was found to be less important as the velocity of the incide
nt ion decreased. In the case of incident Ar+ the substrate material h
ad a negligible effect on the emission for this energy range. The pres
ence of an adsorbed layer enhanced emission in all cases. Heating the
substrates resulted in oxidation of the surfaces and a subsequent incr
ease in emission. The electron emission from aluminum samples with sma
ller grain sizes was higher than samples of identical composition with
larger grains. This effect is due to the greater number of adsorption
sites resulting from the higher grain boundary area.