MAGNETRON SPUTTER EPITAXY AND CHARACTERIZATION OF INSB IN(1-X)AL(X)SBSTRAINED-LAYER SUPERLATTICES/

Citation
Jb. Webb et al., MAGNETRON SPUTTER EPITAXY AND CHARACTERIZATION OF INSB IN(1-X)AL(X)SBSTRAINED-LAYER SUPERLATTICES/, Journal of crystal growth, 137(3-4), 1994, pp. 405-414
Citations number
20
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
137
Issue
3-4
Year of publication
1994
Pages
405 - 414
Database
ISI
SICI code
0022-0248(1994)137:3-4<405:MSEACO>2.0.ZU;2-E
Abstract
Strained layer superlattices of InSb/In1-xAl(x)Sb with 0 < x < 0.5 hav e been grown on (001)InSb by magnetron sputter epitaxy. The crystallin e quality and interface sharpness of the superlattice layers, evaluate d by X-ray diffraction, Raman spectroscopy, and transmission electron microscopy were found to be comparable to the best results obtained fo r other III-V material systems when grown by molecular beam epitaxy. I t is demonstrated that magnetron sputter epitaxy allows precise contro l of the composition of the layers and layer thicknesses with excellen t reproducibility.