CRYSTALLIZATION KINETICS OF POLYSILAZANE-DERIVED AMORPHOUS-SILICON NITRIDE

Citation
M. Seher et al., CRYSTALLIZATION KINETICS OF POLYSILAZANE-DERIVED AMORPHOUS-SILICON NITRIDE, Journal of crystal growth, 137(3-4), 1994, pp. 452-456
Citations number
13
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
137
Issue
3-4
Year of publication
1994
Pages
452 - 456
Database
ISI
SICI code
0022-0248(1994)137:3-4<452:CKOPAN>2.0.ZU;2-N
Abstract
The crystallization behaviour of amorphous silicon nitride (Si3N4) der ived from chlorine-free polysilazanes was investigated by quantitative optical microscopy. The kinetic parameters, i.e. rate constants and a ctivation energy, were calculated by a modified Avrami-Erofe'ev equati on. In contrast to former investigations on amorphous Si3N4 synthesize d from a chlorine-containing polysilazane, the crystallization tempera ture is shifted to lower (about 200 K) temperatures, while the activat ion energy remains almost constant.