THE SURFACE EVOLUTION AND KINETIC ROUGHENING DURING HOMOEPITAXY OF GAAS (001)

Citation
Bg. Orr et al., THE SURFACE EVOLUTION AND KINETIC ROUGHENING DURING HOMOEPITAXY OF GAAS (001), Solid-state electronics, 37(4-6), 1994, pp. 1057-1063
Citations number
30
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
37
Issue
4-6
Year of publication
1994
Pages
1057 - 1063
Database
ISI
SICI code
0038-1101(1994)37:4-6<1057:TSEAKR>2.0.ZU;2-U
Abstract
Scanning tunneling microscopy studies have been performed on GaAs homo epitaxial films grown by molecular-beam epitaxy. Images show that in t he earliest stages of deposition the morphology oscillates between one with two-dimensional islands and flat terraces. After the initial tra nsient regime, the system evolves to a dynamical steady state. This st ate is characterized by a constant step density and as such the growth mode can be termed step flow. Comparison with reflection high-energy electron-diffraction (RHEED) shows that there is a direct corresponden ce between the surface step density and the RHEED specular intensity. Thick films (up to 1450 monolayers) display a slowly-increasing surfac e roughness. Analysis of the scaling properties and comparison with th eories of film growth will be made.