W. Cao et al., MICROSTRUCTURE OF SPUTTERED EPITAXIAL NI0.80FE0.20 NIXCO1-X EXCHANGE-COUPLED BILAYERS ON ALPHA-AL2O3 (0001)/, Journal of electronic materials, 23(10), 1994, pp. 1043-1046
Epitaxial Ni0.80Fe0.20/NixCo1-xO bilayers have been grown on alpha-Al2
O3 (0001) substrates by dc-sputtering. X-ray diffraction and transmiss
ion electron microscopy have been employed to characterize these excha
nge-coupled films. The x-ray diffraction spectrum shows only the (111)
family of peaks in both Ni0.80Fe0.20 and NixCo1-xO films. Growth orie
ntation relationships have been determined from diffraction patterns t
aken in planar view and cross section. The relationships are: (111) Ni
0.80Fe0.20//(111) NixCo1-xO//(0001) alpha-Al2O3 and [110BAR] Ni0.80Fe0
.20 //[110BAR] NixCo1-xO//[1100BAR] alpha-Al2O3. The microstructure of
these films as well as the interfacial structure between Ni0.80Fe0.20
and NixCo1-xO have been analyzed in high resolution electron microsco
py and are described in this paper. In addition, the dependence of the
exchange coupling field on interfacial roughness is discussed.