A. Essoltani et al., VOLUMETRIC EMISSION OF ARGON PLASMAS IN THE PRESENCE OF VAPORS OF FE,SI, AND AL, Plasma chemistry and plasma processing, 14(4), 1994, pp. 437-450
The net volumetric emission was calculated for argon plasmas at atmosp
heric pressure in the presence of metal vapors for different elements,
over the temperature range from 3000 to 30,000 K. the computations ar
e based on the escape factor model, using a semi-empirical method for
the determination of line profiles and line broadening effects. Result
s for iron, silicon, and aluminum show an important influence of the p
resence of even the smallest concentrations of the metal vapors on the
net emission coefficient of the plasma. the effect is strongest for i
ron, followed by aluminum and silicon. Special attention is given to s
elf-absorption effects which are most important in the first millimete
r of the optical path of the emitted radiation. The effect is incorpor
ated into the calculation procedure of the net emission coefficient an
d can be used as a volumetric energy sink as long as the absorption le
ngth is shorter than the radius of the control volume used in the comp
utation scheme.