THE PRESENT POSITION AND FUTURE-STATUS OF ELECTRON-BEAM LITHOGRAPHY FOR VLSI FABRICATION

Electron beam lithography is available in fabrication for ASIC-LS Is i n order to contribute QTAT process and cost saving for optical reticle making. On the other hand the optical lithography is facing difficult y in the resolution for isolated pattern arrangement under quarter mic ron region even if KrF excimer laser lithography is used. It is expect ed that the electron beam lithography will play a complementary role f or the optical lithography. The mix-and-match strategy will be open th e door for the large volume production-use of the electron beam lithog raphy.