T. Matsuzaka, THE PRESENT POSITION AND FUTURE-STATUS OF ELECTRON-BEAM LITHOGRAPHY FOR VLSI FABRICATION, Microelectronic engineering, 35(1-4), 1997, pp. 3-9
Electron beam lithography is available in fabrication for ASIC-LS Is i
n order to contribute QTAT process and cost saving for optical reticle
making. On the other hand the optical lithography is facing difficult
y in the resolution for isolated pattern arrangement under quarter mic
ron region even if KrF excimer laser lithography is used. It is expect
ed that the electron beam lithography will play a complementary role f
or the optical lithography. The mix-and-match strategy will be open th
e door for the large volume production-use of the electron beam lithog
raphy.