INVESTIGATION OF ENVIRONMENTAL STABILITY IN CHEMICALLY AMPLIFIED RESISTS

This paper describes the environmental stability in chemically amplifi ed resists, especially post exposure delay stability depending on NH3 concentration in the atmosphere around resists, and substrate sensitiv ity. The environmentally stable chemically amplified resists, ARCH2 an d KRF L7G, exhibited high resistance to both airborne contamination an d substrate contamination. These resists may be used without chemical filters, which removes base contamination in the air. However, the res ist footing caused by the low light strength at the bottom of the resi st film, were not eased even in these resists, because acid diffusion was restrained in these resists.