G. Arthur et B. Martin, A NOVEL METHOD OF OPTICAL PROXIMITY CORRECTION USING ANTIREFLECTIVE LAYERS AND INDIVIDUAL PHOTORESIST CHARACTERISTICS, Microelectronic engineering, 35(1-4), 1997, pp. 185-188
The optical proximity effect known as dense/isolated offset is investi
gated. The magnitude of this effect is found to be dependant upon resi
st type, film thickness and substrate reflectivity. It is shown that b
y the application of a bottom anti-reflective coating (ARC) and carefu
l matching of the photoresist to the application, offset can be substa
ntially eliminated.