A NOVEL METHOD OF OPTICAL PROXIMITY CORRECTION USING ANTIREFLECTIVE LAYERS AND INDIVIDUAL PHOTORESIST CHARACTERISTICS

Authors
ARTHUR G MARTIN B
Citation
G. Arthur et B. Martin, A NOVEL METHOD OF OPTICAL PROXIMITY CORRECTION USING ANTIREFLECTIVE LAYERS AND INDIVIDUAL PHOTORESIST CHARACTERISTICS, Microelectronic engineering, 35(1-4), 1997, pp. 185-188
Citations number
6
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
35
Issue
1-4
Year of publication
1997
Pages
185 - 188
Database
ISI
SICI code
0167-9317(1997)35:1-4<185:ANMOOP>2.0.ZU;2-Q
Abstract
The optical proximity effect known as dense/isolated offset is investi gated. The magnitude of this effect is found to be dependant upon resi st type, film thickness and substrate reflectivity. It is shown that b y the application of a bottom anti-reflective coating (ARC) and carefu l matching of the photoresist to the application, offset can be substa ntially eliminated.