ANALYSIS OF SIDE-LOBE PRINTABILITY IN SUB-HALF-MICRON CONTACT HOLE DEFINITION

Authors
MARTIN B ARTHUR G
Citation
B. Martin et G. Arthur, ANALYSIS OF SIDE-LOBE PRINTABILITY IN SUB-HALF-MICRON CONTACT HOLE DEFINITION, Microelectronic engineering, 35(1-4), 1997, pp. 197-200
Citations number
5
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
35
Issue
1-4
Year of publication
1997
Pages
197 - 200
Database
ISI
SICI code
0167-9317(1997)35:1-4<197:AOSPIS>2.0.ZU;2-6
Abstract
Printability of side-lobes adjacent to sub-half-micron contact holes d efined using an attenuated phase-shift mask at i-line exposure is inve stigated by practical experiment and computer simulation. Results show that, when printed at nominal size and best focus, side-lobes are pre sent at 0.35 mu m but reduce as contact hole size increases and are on ly printed out-of-focus at 0.4 mu m resolution.