B. Martin et G. Arthur, ANALYSIS OF SIDE-LOBE PRINTABILITY IN SUB-HALF-MICRON CONTACT HOLE DEFINITION, Microelectronic engineering, 35(1-4), 1997, pp. 197-200
Printability of side-lobes adjacent to sub-half-micron contact holes d
efined using an attenuated phase-shift mask at i-line exposure is inve
stigated by practical experiment and computer simulation. Results show
that, when printed at nominal size and best focus, side-lobes are pre
sent at 0.35 mu m but reduce as contact hole size increases and are on
ly printed out-of-focus at 0.4 mu m resolution.