SCANNING PROBE SHARP TIP FORMATION FOR IC INTEGRATION USING MESA TECHNIQUE

Authors
GRABIEC PB SHI F HUDEK P GOTSZALK T ZABROWSKI M DUMANIA P RANGELOW IW
Citation
Pb. Grabiec et al., SCANNING PROBE SHARP TIP FORMATION FOR IC INTEGRATION USING MESA TECHNIQUE, Microelectronic engineering, 35(1-4), 1997, pp. 329-332
Citations number
4
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
35
Issue
1-4
Year of publication
1997
Pages
329 - 332
Database
ISI
SICI code
0167-9317(1997)35:1-4<329:SPSTFF>2.0.ZU;2-W
Abstract
A novel technique utilising mesa island and double-side micromachining for formation of a sharp silicon tip, integrated with a cantilever be am and electrical circuits is described in this paper. Technological p rocess which involves bi-layer coating for effective protection of mic roelectronic elements during wet etching in aggressive alkaline soluti ons is demonstrated. The described technology enables fabrication of f ully integrated AFM probes, consisting of a microtip, sensing element and microelectronic circuit.