ELECTRON-BEAM LITHOGRAPHY OF PHASE MASK GRATINGS FOR NEAR-FIELD HOLOGRAPHIC PRODUCTION OF OPTICAL-FIBER GRATINGS

Authors
LIU X AITCHISON JS DELARUE RM THOMS S ZHANG L WILLIAMS JAR BENNION I
Citation
X. Liu et al., ELECTRON-BEAM LITHOGRAPHY OF PHASE MASK GRATINGS FOR NEAR-FIELD HOLOGRAPHIC PRODUCTION OF OPTICAL-FIBER GRATINGS, Microelectronic engineering, 35(1-4), 1997, pp. 345-348
Citations number
6
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
35
Issue
1-4
Year of publication
1997
Pages
345 - 348
Database
ISI
SICI code
0167-9317(1997)35:1-4<345:ELOPMG>2.0.ZU;2-P
Abstract
This paper reports on processing methods used to produce phase masks f or near field holographic writing of fibre gratings. The masks are pro duced using e-beam lithography (EBL) and reactive ion etching (RIE). W e shall discuss the relations between grating parameters such as ridge duty cycle and groove-depth and processing conditions such as exposur e dose and resist profiles.