FOCUSED ION-BEAMS IN MICROSYSTEM FABRICATION

Authors
DANIEL JH MOORE DF WALKER JF WHITNEY JT
Citation
Jh. Daniel et al., FOCUSED ION-BEAMS IN MICROSYSTEM FABRICATION, Microelectronic engineering, 35(1-4), 1997, pp. 431-434
Citations number
9
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
35
Issue
1-4
Year of publication
1997
Pages
431 - 434
Database
ISI
SICI code
0167-9317(1997)35:1-4<431:FIIMF>2.0.ZU;2-B
Abstract
Focused ion beam (FIB) systems are widely used in microelectronics for prototype modification, device failure analysis and process monitorin g. With the growing importance of micro-electro-mechanical systems (ME MS) the question arises whether FIB can be successfully and economical ly applied to prototyping and production in that area.