J. Teichert et al., FABRICATION OF MSM DETECTOR STRUCTURES ON SILICON BY FOCUSED ION-BEAMIMPLANTATION, Microelectronic engineering, 35(1-4), 1997, pp. 455-458
We report the fabrication of metal-semiconducror-metal (MSM) photo det
ectors on silicon substrates with CoSi2 electrodes. The electrode patt
erns have been formed by ion beam synthesis applying maskless implanta
tion with a cobalt focused ion beam. Implantation has been carried out
with the substrate at room temperature and at 400 degrees C.