A ONE-DIMENSIONAL DEMONSTRATION OF SPATIAL-PHASE-LOCKED ELECTRON-BEAMLITHOGRAPHY

Authors
GOODBERLET J SILVERMAN S FERRERA J MONDOL M SCHATTENBURG ML SMITH HI
Citation
J. Goodberlet et al., A ONE-DIMENSIONAL DEMONSTRATION OF SPATIAL-PHASE-LOCKED ELECTRON-BEAMLITHOGRAPHY, Microelectronic engineering, 35(1-4), 1997, pp. 473-476
Citations number
4
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
35
Issue
1-4
Year of publication
1997
Pages
473 - 476
Database
ISI
SICI code
0167-9317(1997)35:1-4<473:AODOSE>2.0.ZU;2-Q
Abstract
Secondary-electron signals from a global-fiducial grid have been measu red. The signal quality was determined to be adequate for accurate pha se locking. Spatial-phase locking of an electron beam to a 400 nm-peri od grating, with an estimated precision of 3 sigma = 14 nm, was demons trated.