DEEP, 3-DIMENSIONAL LITHOGRAPHY WITH A LASER-PLASMA X-RAY SOURCE AT 1-NM WAVELENGTH

Soft x-rays with 1 nm wavelength are used to print 48 mu m deep struct ures in chemically amplified resist. A multiple exposure/development t echnique reduces the x-ray exposure time to a total of 10min when usin g a compact, laser-plasma x-ray source. The use of an embedded mask ge nerates a true three dimensional structure. Only 2 mu m thick x-ray ma sks are used with such soft x-rays. A 2.5THz waveguide cavity is fabri cated using this novel process.