M. Haverlag et al., MEASUREMENTS OF RADICAL DENSITIES IN RADIOFREQUENCY FLUOROCARBON PLASMAS USING INFRARED-ABSORPTION SPECTROSCOPY, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3102-3108
Citations number
25
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Densities of CF2 radicals, rotational temperatures, and the degree of
dissociation in radio-frequency fluorocarbon plasmas have been measure
d using Fourier transform infrared absorption spectroscopy and tunable
diode laser infrared absorption spectroscopy. The CF2 densities obtai
ned in CF4, CHF3, C2F6, and CF2Cl2 plasmas indicate that the partial p
ressure of CF2 is around 1%-5% of the total pressure. From the spatial
dependence of the CF2 density it was established that at high pressur
e, CF2 is produced either on the rf electrode or close to the rf elect
rode. Furthermore, a comparison between measured absorption spectra an
d a simulation of the rotational distributions has revealed that the r
otational temperatures of CF4, CF2, and HF are all close to room tempe
rature. FTIR spectra indicate that in plasmas of gases with a low F/C
ratio (due to the presence of H or Cl) the source gas is converted for
a significant part into other species.