Jp. Andre et al., IRON SILICIDE GROWTH ON SI(111) SUBSTRATE USING THE METALORGANIC VAPOR-PHASE EPITAXY PROCESS, Journal of crystal growth, 144(1-2), 1994, pp. 29-40
Iron silicide thin films (epsilon-FeSi, alpha-FeSi2 and beta-FeSi2) we
re grown on silicon (111) substrates using the metalorganic vapour pha
se epitaxy (MOVPE) process with iron pentacarbonyl (Fe(CO)(5)) and dis
ilane (Si2H6) precursors. Attention was mainly paid to the beta-FeSi2
phase. Transmission electron microscopy (TEM) and X-ray diffraction me
asurements allowed optimization of the growth process and revealed the
nature and structure of the layers grown on the silicon substrate. A
growth model is discussed and the action of the thermal annealing, whi
ch leads to the coalescence of the dendrites to form a continuous film
of beta-FeSi2 up to about 1000 Angstrom thick, is described. Finally
a photoluminescence signal has been detected in the range of the expec
ted direct band gap value of beta-FeSi2.