IRON SILICIDE GROWTH ON SI(111) SUBSTRATE USING THE METALORGANIC VAPOR-PHASE EPITAXY PROCESS

Citation
Jp. Andre et al., IRON SILICIDE GROWTH ON SI(111) SUBSTRATE USING THE METALORGANIC VAPOR-PHASE EPITAXY PROCESS, Journal of crystal growth, 144(1-2), 1994, pp. 29-40
Citations number
20
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
144
Issue
1-2
Year of publication
1994
Pages
29 - 40
Database
ISI
SICI code
0022-0248(1994)144:1-2<29:ISGOSS>2.0.ZU;2-8
Abstract
Iron silicide thin films (epsilon-FeSi, alpha-FeSi2 and beta-FeSi2) we re grown on silicon (111) substrates using the metalorganic vapour pha se epitaxy (MOVPE) process with iron pentacarbonyl (Fe(CO)(5)) and dis ilane (Si2H6) precursors. Attention was mainly paid to the beta-FeSi2 phase. Transmission electron microscopy (TEM) and X-ray diffraction me asurements allowed optimization of the growth process and revealed the nature and structure of the layers grown on the silicon substrate. A growth model is discussed and the action of the thermal annealing, whi ch leads to the coalescence of the dendrites to form a continuous film of beta-FeSi2 up to about 1000 Angstrom thick, is described. Finally a photoluminescence signal has been detected in the range of the expec ted direct band gap value of beta-FeSi2.