OPTIMIZED STRAINED INXGA1-XAS STRUCTURES FOR DEVICE APPLICATION

Citation
W. Klein et al., OPTIMIZED STRAINED INXGA1-XAS STRUCTURES FOR DEVICE APPLICATION, Journal of crystal growth, 127(1-4), 1993, pp. 36-40
Citations number
12
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
127
Issue
1-4
Year of publication
1993
Pages
36 - 40
Database
ISI
SICI code
0022-0248(1993)127:1-4<36:OSISFD>2.0.ZU;2-#
Abstract
Strained InGaAs/(AlGa)As quantum wells were grown on GaAs by molecular beam epitaxy for optimized device performance. Pseudomorphic growth, i.e., absence of relaxation and misfit dislocations, is conclusively v erified by X-ray diffraction with asymmetric reflexes. Narrow photolum inescence linewidths and pronounced satellite peaks in symmetric diffr action geometry, usually taken as evidence for lateral lattice matchin g, do not suffice. Growth and structure parameters for pseudomorphic d evices will be given.