QUANTUM-WELL LASERS WITH INAS MONOLAYERS IN THE ACTIVE REGION GROWN AT LOW-TEMPERATURE BY ATOMIC LAYER MOLECULAR-BEAM EPITAXY

Strained-layer quantum well lasers have been grown at low substrate te mperature (350-degrees-C) by atomic layer molecular beam epitaxy (ALMB E). A series of five separate confinement laser structures has been gr own. Active regions consist of 80 A of GaAs in which n InAs monolayers are inserted separated by 3 GaAs monolayers, with n = 1, 3, 5 and 7. A sample with 100 angstrom Ga0.8In0.2As active region was also grown a t low temperature for comparison. Structural quality is studied by X-r ay diffraction. Optical characterization has been performed, and the r esults are compared with calculations by a four-band envelope-wavefunc tion method. Broad area lasers have been fabricated, and their perform ances are studied as a function of increasing InAs content. Lasers wit h GaAs active regions including InAs monolayers show threshold current s comparable to that of the GaInAs alloy laser, for n less-than-or-equ al-to 5 monolayers. These results prove the feasibility of ALMBE for t he low temperature growth of strained layer lasers.