We report structural and optical studies of a pin MQW structure grown
on a patterned Si substrate. We find that a high density of microcrack
s in the [110] directions are formed on the plain area of the substrat
e but that these are almost totally absent on the patterned areas. Pho
toluminescence measurements show a shift of QW emission to higher ener
gies as island size is reduced with little change in intensity. These
results show that good quality MQW device structures with reduced stra
in and freedom from microcracks can be grown on patterned Si.