LAYER-BY-LAYER GROWTH-MECHANISM OF ALXGA1-XP GROWN BY GAS-SOURCE MBE

Citation
T. Fujimori et al., LAYER-BY-LAYER GROWTH-MECHANISM OF ALXGA1-XP GROWN BY GAS-SOURCE MBE, Journal of crystal growth, 127(1-4), 1993, pp. 213-216
Citations number
5
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
127
Issue
1-4
Year of publication
1993
Pages
213 - 216
Database
ISI
SICI code
0022-0248(1993)127:1-4<213:LGOAGB>2.0.ZU;2-9
Abstract
The layer-by-layer growth process of AlxGal1-xP (0 less-than-or-equal- to x less-than-or-equal-to 1) was investigated by observing the reflec tion high energy electron diffraction intensity oscillations of the sa mples during growth. The damping of the oscillations were examined and it was found that there were three stages in the damping process. The damping behavior depended on the Al composition. Gallium-rich composi tions (x = 0.23 and 0.37) had a smaller damping rate than that of GaP. Aluminum-rich compositions (x > 0.5) clearly showed the three stages in the damping process, and the observed number of oscillations decrea sed with increasing Al composition. We propose a model for the growth process of AlxGa1-x P. For Ga-rich compositions the layer-by-layer gro wth is enhanced by Al atoms, which reduce the average terrace size. Fo r Al-rich compositions, where nucleation dominates, the surface roughn ess is diminished by Ga atoms which migrate and fill the kink-sites.