A. Freundlich et al., GROWTH OF INAS INP AND INASP/INP HETEROSTRUCTURES BY CHEMICAL BEAM EPITAXY/, Journal of crystal growth, 127(1-4), 1993, pp. 246-250
We report for the first time that high quality pseudomorphically strai
ned InAs1-xPx/InP and InAs/InP (3% lattice mismatch) superlattices (SL
) and strained multi-quantum wells (SMQWs) can be grown by chemical be
am epitaxy (CBE). Structural properties and interface sharpness are in
vestigated as a function of growth temperature within a range of 420 t
o 540-degrees-C. Interface sharpness, determined through the high reso
lution X-ray diffraction analysis of thin (1-5 monolayers) InAs single
and multi-quantum well structures, is found to be better than 1 monol
ayer over a wide range of growth temperatures (450-490-degrees-C) and
high quality SMQWs and SLs were achieved. Moreover, no temperature dep
endent variation of thicknesses (growth rates) was observed within the
440-500-degrees-C temperature range. The As versus P incorporation ra
tios in ternary InAsP/InP layers were also studied, showing that CBE i
s perfectly suited for a successful control of As composition in such
heterostructures. Finally, the structural and optical properties of gr
own heterostructures, as studied with high resolution X-ray diffractio
n, RHEED and low temperatures photoluminescence analysis, indicate tha
t pseudomorphic InAsP/InP and InAs/InP SMQWs are compatible with long
wavelength (1 to 2 mum) opto-electronic applications.