DETERMINATION OF THE SB COMPOSITION PROFILE IN MBE-GROWN GASB GAAS STRUCTURES BY HIGH-RESOLUTION X-RAY-DIFFRACTOMETRY/

Citation
O. Brandt et al., DETERMINATION OF THE SB COMPOSITION PROFILE IN MBE-GROWN GASB GAAS STRUCTURES BY HIGH-RESOLUTION X-RAY-DIFFRACTOMETRY/, Journal of crystal growth, 127(1-4), 1993, pp. 503-507
Citations number
12
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
127
Issue
1-4
Year of publication
1993
Pages
503 - 507
Database
ISI
SICI code
0022-0248(1993)127:1-4<503:DOTSCP>2.0.ZU;2-7
Abstract
Using high-resolution X-ray diffractometry, we examine the structural and chemical properties of nominally pure GaSb layers in GaAs grown by solid-source molecular beam epitaxy. In thicker films an exponential composition gradient is revealed, with the Sb content reaching 30% aft er 70 nm. Ultrathin GaSb films (a few monolayers) actually contain onl y a few percent Sb, i.e., in the first stage of growth Sb incorporatio n is severly hindered. In contradiction to energetic arguments, we fin d that lowering the growth temperature leads to a decrease of the Sb i ncorporation in the interface region. This finding indicates that the incorporation of the group V atoms in the interface region is strongly affected by kinetic processes.