O. Brandt et al., DETERMINATION OF THE SB COMPOSITION PROFILE IN MBE-GROWN GASB GAAS STRUCTURES BY HIGH-RESOLUTION X-RAY-DIFFRACTOMETRY/, Journal of crystal growth, 127(1-4), 1993, pp. 503-507
Using high-resolution X-ray diffractometry, we examine the structural
and chemical properties of nominally pure GaSb layers in GaAs grown by
solid-source molecular beam epitaxy. In thicker films an exponential
composition gradient is revealed, with the Sb content reaching 30% aft
er 70 nm. Ultrathin GaSb films (a few monolayers) actually contain onl
y a few percent Sb, i.e., in the first stage of growth Sb incorporatio
n is severly hindered. In contradiction to energetic arguments, we fin
d that lowering the growth temperature leads to a decrease of the Sb i
ncorporation in the interface region. This finding indicates that the
incorporation of the group V atoms in the interface region is strongly
affected by kinetic processes.