MICROSCOPIC INVESTIGATION OF THE STRAIN DISTRIBUTION IN INGAAS GAAS QUANTUM-WELL STRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY/

Citation
Mg. Proietti et al., MICROSCOPIC INVESTIGATION OF THE STRAIN DISTRIBUTION IN INGAAS GAAS QUANTUM-WELL STRUCTURES GROWN BY MOLECULAR-BEAM EPITAXY/, Journal of crystal growth, 127(1-4), 1993, pp. 592-595
Citations number
7
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
127
Issue
1-4
Year of publication
1993
Pages
592 - 595
Database
ISI
SICI code
0022-0248(1993)127:1-4<592:MIOTSD>2.0.ZU;2-C
Abstract
Extended X-ray absorption fine structure in the glancing angle geometr y has been used to study the strain accommodation in quantum well stru ctures of InxGa1-xAs/GaAs (x < 0.25). The results show that a number o f Ga-As bond lengths are stretched. Indeed, two Ga-As bonds distances coexist: 2.45 +/- 0.01 angstrom and 2.64 +/- 0.02 angstrom, which corr espond to the Ga-As and In-As bond distances in the binary compounds G aAs and InAs, respectively. This result is independent of the In molar fraction in the strained alloy layers.