ELECTRON-DISTRIBUTION AND ELECTRICAL-PROPERTIES OF INAS QUANTUM-WELLS
Citation
K. Yoh et al., ELECTRON-DISTRIBUTION AND ELECTRICAL-PROPERTIES OF INAS QUANTUM-WELLS, Journal of crystal growth, 127(1-4), 1993, pp. 826-830
Categorie Soggetti
Crystallography
SICI code
0022-0248(1993)127:1-4<826:EAEOIQ>2.0.ZU;2-H
Abstract
We have investigated the dependence of the electrical characteristics
on the vertical electric fields in InAs/(AlxGa1-x)Sb double heterostru
ctures by Hall effect measurements. By measuring the samples with diff
erent upper barrier thicknesses, we have observed the mobility modulat
ion in the (AlGa)Sb/InAs/AlSb heterostructures by effectively changing
the surface electric field. The mobility modulation is attributed to
the modulated scattering probability depending on the electron distrib
ution in the quantum well due to the built-in surface electric field.
The proportionality coefficient of the sheet carrier concentration aga
inst inverse upper barrier thickness roughly corresponds to the potent
ial difference between the Fermi energy in the InAs quantum well and t
he surface pinning level of GaSb under flat-band conditions.